STUDY OF THE STRUCTURAL-PROPERTIES OF ZNO THIN-FILMS BY X-RAY PHOTOELECTRON-SPECTROSCOPY

• Tipo: Artigo em Revista Científica Internacional
• Data: 1994

Autores

MENG, LJ (Autor) Outra; Carlos Sá (Autor) FEUP; DOSSANTOS, MP (Autor) Outra

Revista

Título: Applied Surface Science

Vol. 78

Páginas: 57-61

ISSN: 0169-4332

Editora: Elsevier

Indexação

ISI Web of Knowledge - 69 Citações

Scopus - 74 Citações

Outras Informações

ID Authenticus: P-001-K2P

DOI: 10.1016/0169-4332(94)90031-0

Abstract (EN): X-ray photoelectron spectroscopy (XPS) analysis was performed on ZnO films prepared on glass substrates by DC reactive magnetron sputtering at different substrate temperatures (room temperature to 450-degrees-C). In the 0 ls spectra two resolved peaks were observed. The lower energy peak, located at 530 eV, corresponds to O-Zn bonding, while the higher energy peak, located at 532 eV, could be assigned to OH(531.5 eV) and/or H2O(533 eV) species. As the substrate temperature is increased, the oxygen component located at higher energy decreases. This variation was correlated with the structural properties of the films. The films prepared by DC reactive magnetron sputtering generally have a columnar structure with many pores. In air some of these pores are filled with water and result in the appearance of a higher energy peak in the 0 ls spectra. The decrease of the oxygen component located at higher energy indicates the decrease of the porosity of the films. The results obtained by scanning electron microscopy measurements were in agreement with this conclusion.

Idioma: Inglês

Tipo (Avaliação Docente): Científica

Nº de páginas: 5