Structural study of Si1-xGex nanocrystals embedded in SiO2 films

• Tipo: Artigo em Revista Científica Internacional
• Data: 2010

Autores

Pinto, SRC (Autor) Outra; Kashtiban, RJ (Autor) Outra; Rolo, AG (Autor) Outra; Buljan, M (Autor) Outra; Chahboun, A (Autor) Outra; Bangert, U (Autor) Outra; Barradas, NP (Autor) Outra; Alves, E (Autor) Outra; Gomes, MJM (Autor) Outra

Revista

Título: Thin Solid Films

Vol. 518

Páginas: 2569-2572

ISSN: 0040-6090

Editora: Elsevier

Indexação

ISI Web of Knowledge - 7 Citações

Scopus - 9 Citações

Outras Informações

ID Authenticus: P-003-92Q

DOI: 10.1016/j.tsf.2009.09.148

Abstract (EN): We have investigated the structural properties of Si1-xGex nanocrystals formed in an amorphous SiO2. matrix by magnetron sputtering deposition The influence of deposition parameters on nanocrystal size, shape, arrangement and internal structure was examined by X-ray diffraction, Raman spectroscopy, grazing incidence small angle X-ray scattering, and high resolution transmission electron microscopy We found conditions for the formation of spherical Si1-xGex nanocrystals with average sizes between 3 and 13 nm. uniformly distributed in the matrix In addition we have shown the influence of deposition parameters oil average nanocrystal size and Ge content x.

Idioma: Inglês

Tipo (Avaliação Docente): Científica

Nº de páginas: 4