Structural study of Si1-xGex nanocrystals embedded in SiO2 films

• Type: Article in International Scientific Journal
• Date: 2010

Authors

Pinto, SRC (Author) Other; Kashtiban, RJ (Author) Other; Rolo, AG (Author) Other; Buljan, M (Author) Other; Chahboun, A (Author) Other; Bangert, U (Author) Other; Barradas, NP (Author) Other; Alves, E (Author) Other; Gomes, MJM (Author) Other

Journal

Title: Thin Solid Films

Vol. 518

Pages: 2569-2572

ISSN: 0040-6090

Publisher: Elsevier

Indexing

ISI Web of Knowledge - 7 Citations

Scopus - 9 Citations

Other information

Authenticus ID: P-003-92Q

DOI: 10.1016/j.tsf.2009.09.148

Abstract (EN): We have investigated the structural properties of Si1-xGex nanocrystals formed in an amorphous SiO2. matrix by magnetron sputtering deposition The influence of deposition parameters on nanocrystal size, shape, arrangement and internal structure was examined by X-ray diffraction, Raman spectroscopy, grazing incidence small angle X-ray scattering, and high resolution transmission electron microscopy We found conditions for the formation of spherical Si1-xGex nanocrystals with average sizes between 3 and 13 nm. uniformly distributed in the matrix In addition we have shown the influence of deposition parameters oil average nanocrystal size and Ge content x.

Language: English

Type (Professor's evaluation): Scientific

No. of pages: 4