Resumo (PT):
Abstract (EN):
In this work the description, test, and performance of a new vacuum apparatus for thin film vapor deposition
(ThinFilmVD) of organic semiconductor materials are presented. The apparatus is able to fabricate single, multilayer/
composites, or hybrid thin films using four independent, organic
or inorganic, vapor deposition sources (Knudsen cells type), and
the vapor mass flow is condensed onto a substrate surface
(temperature regulated). The same apparatus could be also used
to measure vapor pressures according to the Knudsen effusion
methodology. Vapor pressures and thermodynamic properties of
sublimation measured by Knudsen effusion of some reference
organic materials (benzoic acid, anthracene, triphenylene,
benzanthrone, 1,3,5-triphenylbenzene, perylene) were used to
evaluate and test the performance of the apparatus. Moreover, nanostructures of thin films and composite materials of relevant
charge transport and electroluminescent materials were deposited onto an indium−tin oxide (ITO) surface, and the morphology
and thin film thickness were evaluated by scanning electron microscopy (SEM), exploring the effect of different mass flow rates
and deposition time. The new physical vapor deposition apparatus based in four Knudsen effusion cells with an accurate mass
flow control was designed to assemble well-defined (composition, morphology, thickness) thin films of organic semiconductors
based on their volatility. The described apparatus presents a high versatility to the fabrication of single/multilayer thin films, asgrown crystals, and hybrid micro- and nanostructured materials
Language:
English
Type (Professor's evaluation):
Scientific
No. of pages:
16