Structure and properties of sputtered TiAl-M (M = Ag, Cr) thin films

• Tipo: Artigo em Revista Científica Internacional
• Data: 1999

Autores

Coelho, C (Autor) Outra; Ramos, AS (Autor) Outra; Trindade, B (Autor) Outra; Vieira, MT (Autor) Outra; Fernandes, JV (Autor) Outra; Vieira, M (Autor) FEUP

Revista

Título: Surface and Coatings Technology

Vol. 120

Páginas: 297-302

ISSN: 0257-8972

Editora: Elsevier

Indexação

ISI Web of Knowledge - 21 Citações

ISI Web of Science

Scopus - 21 Citações

COMPENDEX

Classificação Científica

FOS: Ciências da engenharia e tecnologias > Engenharia dos materiais

Outras Informações

ID Authenticus: P-001-31P

DOI: 10.1016/s0257-8972(99)00500-9

Abstract (EN): The aim of this work was to study the influence of two additional elements - silver and chromium - on the structure and mechanical properties of TiAl-M (M = Ag, Cr) thin films synthesised by sputtering. The films were studied in the as-deposited condition (metastable state) and after successive annealings performed in order to obtain the stable (gamma-TiAl)-based intermetallic phase. The experimental techniques used in this work for chemical and structural characterisation were electron probe microanalysis, transmission electron microscopy/electron diffraction, X-ray diffraction and differential scanning calorimetry. The mechanical analysis consisted of the determination of hardness and ductility. To do this, a new tensile test procedure able to evaluate the ductility of thin films was developed. The results showed that, contrary to the as-deposited state, the addition of silver or chromium does not lead to a significant improvement in the mechanical properties, hardness and ductility of the heat-treated films (gamma-TiAl structure). However, they did contribute to a better understanding of the role of silver and chromium on the structure of these titanium aluminides.

Idioma: Inglês

Tipo (Avaliação Docente): Científica

Nº de páginas: 6