Electrodeposition of an ultrathin TiO2 coating using a deep eutectic solvent based on choline chloride

• Tipo: Artigo em Revista Científica Internacional
• Data: 2018

Autores

Nuno M. Pereira (Autor) FEUP; Carlos M. Pereira (Autor) FCUP; João P. Araújo (Autor) FCUP; António Fernando Silva (Autor) FCUP

Revista

Título: Thin Solid Films

Vol. 645

Páginas: 391-398

ISSN: 0040-6090

Editora: Elsevier

Indexação

ISI Web of Knowledge - 6 Citações

Scopus - 7 Citações

Outras Informações

ID Authenticus: P-00N-8R4

DOI: 10.1016/j.tsf.2017.11.005

Abstract (EN): An alternative route is proposed for direct electrodeposition of TiO2 films. The electrochemical behaviour of Ti (IV) species in the deep eutectic solvent formed between choline chloride (ChCl) and ethylene glycol (EG) was studied by chronoamperometry and cyclic voltammetry. It was discussed that during the cathodic scan soluble subvalent TiCl chi species were formed using the eutectic system 1ChCl:2EG. Using ethylenediamine or LiF as additives it was possible to obtain a titanium dioxide thin film in the orthorhombic variant named brookite. Chronoamperometric investigations revealed a nucleation mechanism involving the simultaneous presence of 2D instantaneous nucleation process including lattice incorporation and a 3D diffusion-limited nucleation and growth process.

Idioma: Inglês

Tipo (Avaliação Docente): Científica

Nº de páginas: 8