Mechanical characterisation of gamma-TiAl thin films obtained by two different sputtering routes

• Type: Article in International Scientific Journal
• Date: 2002

Authors

Vieira, MT (Author) Other; Trindade, B (Author) Other; Ramos, AS (Author) Other; Fernandes, JV (Author) Other; Vieira, MF (Author) FEUP

Journal

The Journal is awaiting validation by the Administrative Services.

Title: MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING

Vol. 329

Pages: 147-152

ISSN: 0921-5093

Indexing

ISI Web of Knowledge - 12 Citations

Scopus - 15 Citations

Scientific classification

FOS: Engineering and technology > Materials engineering

Other information

Authenticus ID: P-000-P81

DOI: 10.1016/s0921-5093(01)01550-7

Abstract (EN): In this study (TiAl)-based films were magnetron sputtered using two different methods: two targets (Ti + Al) and a gamma-TiAl target. In both cases, the as-deposited films had to be heat treated in order to obtain the intermetallic gamma-TiAl. The effect of the addition of chromium on the structure and mechanical properties was studied. The films were submitted to ageing treatments and the resulting structures and mechanical properties were also studied. To get more insight into the films, the residual stresses were also evaluated. After heat treatment (HT), the films sputtered from two targets are constituted by a single gamma-TiAl phase while in the films produced with one target it is possible to observe the presence of the alpha(2)-Ti3Al phase. Under annealing, the as-deposited compressive stresses give rise to low tensile stresses. The 18 h HT leads to a pronounced increase in hardness in the films obtained by using two targets. The hardness of the films produced using one target increases gradually with the HT holding time. In all cases, ductility and hardness exhibit inverse trends.

Language: English

Type (Professor's evaluation): Scientific

No. of pages: 6