Code: | FIS4031 | Acronym: | FIS4031 | Level: | 400 |
Keywords | |
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Classification | Keyword |
OFICIAL | Physics |
Active? | Yes |
Responsible unit: | Department of Physics and Astronomy |
Course/CS Responsible: | Master in Engineering Physics |
Acronym | No. of Students | Study Plan | Curricular Years | Credits UCN | Credits ECTS | Contact hours | Total Time |
---|---|---|---|---|---|---|---|
M:EF | 9 | Official Study Plan since 2021_M:EF | 1 | - | 6 | 42 | 162 |
Metrology is associated with measurement, the concept and general principles, as well as methodologies and techniques supported by them. At a fundamental level involves to understand the problematics about what means to be an Observer; at another level, it is of large practical importance considering the most diverse technological applications require adequate measurement standards and proper metrology to assess the state of systems. In the present case, the focus is to utilize the properties of light in the measurement process, synthetized in the words Optical Metrology. Therefore, this UC has learning objectives which are situated in a broad spectrum, ranging from the understanding of fundamental concepts up to the operational capacity of application of diverse optical measurement techniques especially in the study and application of interferometry in various areas of engineering.
Optical metrology is a particular domain of metrology, the science of measurement with all it implies, to start with to understand what means “to measure” which keeps a central question in science, up to the set up of general methodologies and techniques associated to the measurement process, independently of the implementation technology. This affects the performance level and the application spectrum and is here where optical metrology shows special relevance considering it is normally associated to high performance and large applicability, also a consequence of the unique importance of light. Therefore, there is conviction of the coherence between the programmatic contents with the objectives looked for this UC. These are centred on the comprehension of the measurement process and in the way how it can be delivered to handle specific situations; the programmatic contents concretize such objectives for the particular but especially important case of optical phenomenology.
Optics knowledge.
The course begins with a revision of base phenomena of optical metrology, namely interference and diffraction. A brief review of optical sources and detectors will be presented. Then, it is introduced the problematic of the measurement process in the classic and quantum domains, followed by the exposition of the general principles of optical metrology. The measurement techniques based on modulation of the light intensity are presented, then is introduced an important chapter of this course which is metrology by interferometry. Topics such as types of interferometers, their performance, interaction with the measurand, and optical and optoelectronic processing will be addressed. Techniques and measurement will be studied namely: Measuring the refractive index; Measurement of radius of curvature and focal length; Angle Measurement; Thickness Measurement; Speed measurement; Pressure measurement; Length Measurement. Speckle and Moiré techniques will also be delivered. An important field of metrology deals with imaging, so will be presented the fundamentals of microscopy based on low-coherence, confocal and multiphoton. A final section will detail the principles of fiber optic based metrology and applications.
This course follows a conventional teaching methodology meaning by that lectures with deliver of contents and sessions of problem’s solving. The laboratorial component happens in the framework of dedicated UC which shows a list of laboratorial works/projects.
The evaluation is by a final exam and oral presentation of a work proposal.
designation | Weight (%) |
---|---|
Participação presencial | 10,00 |
Apresentação/discussão de um trabalho científico | 20,00 |
Exame | 70,00 |
Total: | 100,00 |
designation | Time (hours) |
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Estudo autónomo | 100,00 |
Frequência das aulas | 49,00 |
Trabalho escrito | 13,00 |
Total: | 162,00 |
70% final exam + 10% attendance and 20% presentation / discussion of a scientific work.