Effect of oxygen pressure on the structural and magnetic properties of thin Zn0.98Mn0.02O films

• Tipo: Artigo em Revista Científica Internacional
• Data: 2012

Autores

Khodorov, A (Autor) Outra; Rolo, AG (Autor) Outra; Hlil, EK (Autor) Outra; Ayres de Campos, JA (Autor) Outra; Karzazi, O (Autor) Outra; Levichev, S (Autor) Outra; Correia, MR (Autor) Outra; Chahboun, A (Autor) Outra; Gomes, MJM (Autor) Outra

Revista

Título: EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS

Vol. 57

ISSN: 1286-0042

Editora: Palgrave Macmillan

Indexação

ISI Web of Knowledge - 4 Citações

Scopus - 4 Citações

Outras Informações

ID Authenticus: P-002-HCY

DOI: 10.1051/epjap/2011110380

Abstract (EN): Thin Zn0.98Mn0.02O films were grown by pulsed laser deposition on glass substrates under oxygen pressure. The structural properties were studied by X-ray diffraction and Raman techniques, while the conductivity was characterized by the Hall effect. The oxygen pressure during the growth seems to govern the structural and the electrical properties of the thin Zn0.98Mn0.02 films. In fact, the micron size grain and the resistivity of the Zn0.98Mn0.02O increase with the partial oxygen pressure. However, no evident effect was observed on the magnetic behavior. Electronic structure calculations were performed and magnetic moment carried by Mn atom was computed as well.

Idioma: Inglês

Tipo (Avaliação Docente): Científica

Nº de páginas: 6