Modification of Hexatriacontane by O2–N2 Microwave Post-Discharges

• Tipo: Artigo em Revista Científica Internacional
• Data: 2006

Autores

V. Hody (Autor) Outra; Thierry Belmonte (Autor) Outra; Carlos Daniel Diogo Matias Pintassilgo (Autor) FEUP; F. Epaillard (Autor) Outra; Thierry Czerwiec (Autor) Outra; G. Henrion (Autor) Outra; Y. Segui (Autor) Outra; J. Loureiro (Autor) Outra

Revista

Título: Plasma Chemistry and Plasma Processing

Vol. 26 Nº 3

Páginas: 251-266

ISSN: 0272-4324

Editora: Springer Nature

Indexação

ISI Web of Science

Scopus

Classificação Científica

FOS: Ciências exactas e naturais > Física

CORDIS: Ciências Físicas > Física

Outras Informações

Abstract (EN): Etch rates of hexatriacontane (HTC) as high as similar to 10 mg s(-1) m(-2) in late O-2 post-discharge are obtained at 333 K where no significant UV nor VUV irradiation occurs. Introducing N-2 in the gas mixture helps control the ratio of O/O-2 densities, which is shown to play a key role in the functionalization or etching of the HTC. The oxygen atoms are required for any further modification of the HTC because they initiate the formation of the radical chains by abstraction of one hydrogen. O(P-3) atoms do not contribute directly to break the alkane chain close to room temperature but they can functionalise it. O-2 is the important reactive species for the etching because of the role played by the peroxide groups on the scission of the hydrocarbon chains.

Idioma: Português

Tipo (Avaliação Docente): Científica