Magnetic properties of amorphous Co0.74Si0.26/Si multilayers with different numbers of periods

• Tipo: Artigo em Revista Científica Internacional
• Data: 2010

Autores

G.N. Kakazei (Autor) FCUP; N.M. Santos (Autor) Outra; C. Quiros (Autor) Outra; M. Velez (Autor) FCUP; J.I. Martin (Autor) Outra; J.M. Alameda (Autor) FCUP; V.O. Golub (Autor) Outra; O.Y. Saliuk (Autor) Outra; Y.G. Pogorelov (Autor) FCUP; J.B. Sousa (Autor) FCUP; M.C. Carmo (Autor) Outra; N.A. Sobolev (Autor) Outra

Revista

Título: Journal of Nanoscience and Nanotechnology

Vol. 36 Nº 8-9

Páginas: 821-825

ISSN: 1533-4880

Editora: American Scientific Publishers

Indexação

ISI Web of Science

Classificação Científica

FOS: Ciências exactas e naturais > Física

Outras Informações

Abstract (EN): Two sets of [Co0.74Si0.26(5nm)/Si(s)](n) amorphous films were prepared by magnetron sputtering: one in the form of multilayers with the Si spacer thickness s fixed at 3 nm, and the number n of periods varying from 1 to 10 and the other with only two periods and s varying from 3 to 24 nm (trilayers). In both sets, the Co0.74Si0.26 layer thickness t was fixed at 5 nm. All the samples except the one with s=24 nm manifest antiferromagnetic coupling. Their magnetic properties at room temperature were probed using the magnetooptical transverse Kerr effect (MOTKE) and ferromagnetic resonance (FMR). The relative increase in the saturation magnetization M-s (for trilayers, relative to a structure with s=24 nm; for multilayers, relative to the single-layer structure) determined from the FMR measurements was compared with the exchange coupling strength H-J(AF) obtained from the MOTKE studies. The dependences of H-J(AF) and M-s on n and s were found to be very similar to each other. Possible mechanisms of this similarity are discussed. (C) 2010 American Institute of Physics.

Idioma: Inglês

Tipo (Avaliação Docente): Científica