Enhanced resistive switching characteristics in Pt/BaTiO3/ITO structures through insertion of HfO2:Al2O3 (HAO) dielectric thin layer

• Tipo: Artigo em Revista Científica Internacional
• Data: 2017

Autores

Silva, JPB (Autor) Outra; Faita, FL (Autor) Outra; Kamakshi, K (Autor) Outra; Sekhar, KC (Autor) Outra; Agostinho Moreira, JA (Autor) FCUP; Almeida, A (Autor) FCUP; Pereira, M (Autor) Outra; Pasa, AA (Autor) Outra; Gomes, MJM (Autor) Outra

Revista

Título: Scientific Reports

Vol. 7

Página Final: 46350

ISSN: 2045-2322

Editora: Springer Nature

Indexação

ISI Web of Knowledge - 31 Citações

Scopus - 32 Citações

Outras Informações

ID Authenticus: P-00M-NFE

DOI: 10.1038/srep46350

Abstract (EN): An enhanced resistive switching (RS) effect is observed in Pt/BaTiO3(BTO)/ITO ferroelectric structures when a thin HfO2: Al2O3 (HAO) dielectric layer is inserted between Pt and BTO. The P-E hysteresis loops reveal the ferroelectric nature of both Pt/BTO/ITO and Pt/HAO/BTO/ITO structures. The relation between the RS and the polarization reversal is investigated at various temperatures in the Pt/HAO/BTO/ITO structure. It is found that the polarization reversal induces a barrier variation in the Pt/HAO/BTO interface and causes enhanced RS, which is suppressed at Curie temperature (T-c = 140 degrees C). Furthermore, the Pt/HAO/BTO/ITO structures show promising endurance characteristics, with a RS ratio > 10(3) after 10(9) switching cycles, that make them potential candidates for resistive switching memory devices. By combining ferroelectric and dielectric layers this work provides an efficient way for developing highly efficient ferroelectric-based RS memory devices.

Idioma: Inglês

Tipo (Avaliação Docente): Científica

Nº de páginas: 10