Electrical characterization of Ag:TiN thin films produced by glancing angle deposition

• Tipo: Artigo em Revista Científica Internacional
• Data: 2014

Autores

Pedrosa, P (Autor) Outra; Lopes, C (Autor) Outra; Martin, N (Autor) Outra; C. Fonseca (Autor) FEUP; Vaz, F (Autor) Outra

Revista

Título: Materials Letters

Vol. 115

Páginas: 136-139

ISSN: 0167-577X

Editora: Elsevier

Indexação

ISI Web of Knowledge - 26 Citações

Scopus - 27 Citações

Outras Informações

ID Authenticus: P-008-GDG

DOI: 10.1016/j.matlet.2013.10.044

Abstract (EN): Columnar Ag:TiN thin films were prepared by d.c. magnetron sputtering with a Ag content of similar to 10 at.% on silicon and glass substrates. The Glancing Angle Deposition, GLAD, technique was implemented to transform the typical columnar microstructure into the desired inclined, zigzag and spiral profiles. A periodic variation of the angle of incidence 'alpha' (40 degrees, 60 degrees and 80 degrees) was applied to deposit Ag:TiN thin films with inclined, zigzag and spiral microstructures. The film's electrical properties were studied. Higher alpha values lead to more porous microstructures with column angle beta varying from 13 degrees (alpha=40 degrees) to 30 degrees (alpha=80 degrees) for 8 zigzags. Resistivity, rho, at 293 K or versus temperature was found to be connected to the porosity and beta angles. The more compact films exhibited lower and more stable resistivity values than the more porous ones. Ag segregation and TiN columnar oxidation are favored by temperature and were also found to depend on the produced architectures.

Idioma: Inglês

Tipo (Avaliação Docente): Científica

Nº de páginas: 4