Bottom electrode crystallization method for heat treatments on thin films

• Tipo: Artigo em Revista Científica Internacional
• Data: 2004

Autores

joanni, e (Autor) Outra; mardare, ai (Autor) Outra; mardare, cc (Autor) Outra; marques, mb (Autor) FCUP

Revista

Título: Review of Scientific Instruments

Vol. 75

Páginas: 2950-2954

ISSN: 0034-6748

Editora: American Institute of Physics

Indexação

ISI Web of Knowledge - 2 Citações

Scopus - 2 Citações

Outras Informações

ID Authenticus: P-000-8X7

DOI: 10.1063/1.1783595

Abstract (EN): A simple method for crystallizing amorphous thin films was developed using platinum bottom electrodes as heating elements. A current was applied to tungsten wires in contact with the platinum and the temperature was measured using a type-K thermocouple. A proportional feedback algorithm was used for controlling the process. The performance of different platinum electrodes was studied. Pt films with different thicknesses were alternatively deposited over Ti and Zr at 700degreesC. Applying currents up to 2 A to the Pt films, the resistance dependence of temperature was studied. The maximum temperature, 675degreesC, was obtained when using 200 nm Pt films deposited at 700degreesC over Ti, with a power consumption of 16 W. The method was applied to the crystallization of PbZr0.52Ti0.48O3 thin films using Pt films deposited at 500degreesC over Ti and at 700degreesC over Zr. The results obtained for heat treatments at 650degreesC with 10degreesC/s heating and cooling rates showed a pure perovskite phase; the ferroelectric properties were comparable with those from films crystallized by rapid thermal annealing. (C) 2004 American Institute of Physics.

Idioma: Inglês

Tipo (Avaliação Docente): Científica

Nº de páginas: 5