Effect of Oxygen Plasma on the Optical Properties of Monolayer Graphene

• Tipo: Artigo em Revista Científica Internacional
• Data: 2014

Autores

Santoso, I (Autor) Outra; Singh, RS (Autor) Outra; Gogoi, PK (Autor) Outra; Asmara, TC (Autor) Outra; Wei, DC (Autor) Outra; Chen, W (Autor) Outra; Wee, AT (Autor) Outra; Pereira, VM (Autor) Outra; Rusydi, A (Autor) Outra

Revista

Título: Advanced Materials Research

Vol. 93

Páginas: 510-513

ISSN: 1022-6680

Editora: Trans Tech Publications

Outras Informações

ID Authenticus: P-00X-76B

DOI: 10.4028/www.scientific.net/amr.896.510

Abstract (EN): <jats:p>The significant alteration of absorption (<jats:italic>A</jats:italic>) of monolayer graphene under mild oxygen plasma exposure has been observed. The first important effect is the reduction of the excitonic resonance peak at 4.64 eV. Secondly, in the near infrared range, <jats:italic>A</jats:italic> is gradually suppressed below an exposure-dependent threshold in sense that <jats:italic>A</jats:italic> << <jats:italic>A</jats:italic><jats:sub>0</jats:sub>. Quantity <jats:italic>A</jats:italic><jats:sub>0</jats:sub> (given by <jats:italic>¿¿</jats:italic> and ¿ is the fine structure constant) denotes constant absorption and relates to universal optical conductivity ¿<jats:sub>0</jats:sub>. The suppression of <jats:italic>A</jats:italic><jats:sub>0</jats:sub> can be thought as the weakening of electron-hole interaction as displayed by the reduction of the excitonic resonance peak at 4.64 eV. The weakening of this interaction is due to the disorder introduced by the oxygen plasma exposure.</jats:p>

Idioma: Inglês

Tipo (Avaliação Docente): Científica