Effect of Oxygen Plasma on the Optical Properties of Monolayer Graphene

• Type: Article in International Scientific Journal
• Date: 2014

Authors

Santoso, I (Author) Other; Singh, RS (Author) Other; Gogoi, PK (Author) Other; Asmara, TC (Author) Other; Wei, DC (Author) Other; Chen, W (Author) Other; Wee, AT (Author) Other; Pereira, VM (Author) Other; Rusydi, A (Author) Other

Journal

Title: Advanced Materials Research

Vol. 93

Pages: 510-513

ISSN: 1022-6680

Publisher: Trans Tech Publications

Other information

Authenticus ID: P-00X-76B

DOI: 10.4028/www.scientific.net/amr.896.510

Abstract (EN): <jats:p>The significant alteration of absorption (<jats:italic>A</jats:italic>) of monolayer graphene under mild oxygen plasma exposure has been observed. The first important effect is the reduction of the excitonic resonance peak at 4.64 eV. Secondly, in the near infrared range, <jats:italic>A</jats:italic> is gradually suppressed below an exposure-dependent threshold in sense that <jats:italic>A</jats:italic> << <jats:italic>A</jats:italic><jats:sub>0</jats:sub>. Quantity <jats:italic>A</jats:italic><jats:sub>0</jats:sub> (given by <jats:italic>¿¿</jats:italic> and ¿ is the fine structure constant) denotes constant absorption and relates to universal optical conductivity ¿<jats:sub>0</jats:sub>. The suppression of <jats:italic>A</jats:italic><jats:sub>0</jats:sub> can be thought as the weakening of electron-hole interaction as displayed by the reduction of the excitonic resonance peak at 4.64 eV. The weakening of this interaction is due to the disorder introduced by the oxygen plasma exposure.</jats:p>

Language: English

Type (Professor's evaluation): Scientific