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In situ FT-IR study of the interfacial oxide in the anodic dissolution of silicon

Title
In situ FT-IR study of the interfacial oxide in the anodic dissolution of silicon
Type
Article in International Scientific Journal
Year
1997
Authors
C. Fonseca
(Author)
FEUP
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F.Ozanam
(Author)
Other
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J.N.Chazalviel
(Author)
Other
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Journal
Title: Mikrochimica ActaImported from Authenticus Search for Journal Publications
Pages: 811-813
ISSN: 0026-3672
Publisher: Springer Nature
Indexing
Publicação em ISI Web of Science ISI Web of Science
Scientific classification
FOS: Engineering and technology > Other engineering and technologies
Other information
Language: Portuguese
Type (Professor's evaluation): Scientific
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