Publications with the same journal as the In situ characterization of the p-Si/NH4F interface during dissolution in the current oscillations regime publication
Joana G Silva (Author) (Other); Eliana M Tavares (Author) (Other); Luis M Goncalves (Author) (FCUP); Ines M Valente (Author) (Other); Daniel O Carvalho (Author) (Other); Jose A Rodrigues (Author) (FCUP)
Lagarteira, T (Author) (Other); Pacheco, P (Author) (Other); Almeida, C (Author) (Other); Bentien, A (Author) (Other); Monteiro, R (Author) (Other); Adélio Mendes (Author) (FEUP)
Starykevich, M. (Author) (Other); Salak, A. N. (Author) (Other); Ivanou, D. K. (Author) (FEUP); Yasakau, K. A. (Author) (Other); André, P. S. (Author) (Other); Ferreira, R. A. S. (Author) (Other); Zheludkevich, M. L. (Author) (Other); Ferreira, M. G. S. (Author) (Other)