A new OMCVD iridium precursor for thin film deposition

• Type: Article in International Scientific Journal
• Date: 2001

Authors

Serp, P (Author) Other; Feurer, R (Author) Other; Kalck, P (Author) Other; Gomes, H (Author) Other; Faria, JL (Author) FEUP; Figueiredo, JL (Author) FEUP

Journal

Title: Chemical Vapour Deposition

Vol. 7

Pages: 59-62

ISSN: 0948-1907

Publisher: John Wiley & Sons

Indexing

ISI Web of Knowledge - 12 Citations

ISI Web of Science

Scopus - 15 Citations

COMPENDEX

Scientific classification

FOS: Engineering and technology > Materials engineering

Other information

Authenticus ID: P-000-W6R

DOI: 10.1002/1521-3862(200103)7:2<59::aid-cvde59>3.0.co;2-s

Language: English

Type (Professor's evaluation): Scientific

No. of pages: 4