Structure and properties of sputtered TiAl-M (M = Ag, Cr) thin films

• Type: Article in International Scientific Journal
• Date: 1999

Authors

Coelho, C (Author) Other; Ramos, AS (Author) Other; Trindade, B (Author) Other; Vieira, MT (Author) Other; Fernandes, JV (Author) Other; Vieira, M (Author) FEUP

Journal

Title: Surface and Coatings Technology

Vol. 120

Pages: 297-302

ISSN: 0257-8972

Publisher: Elsevier

Indexing

ISI Web of Knowledge - 21 Citations

ISI Web of Science

Scopus - 21 Citations

COMPENDEX

Scientific classification

FOS: Engineering and technology > Materials engineering

Other information

Authenticus ID: P-001-31P

DOI: 10.1016/s0257-8972(99)00500-9

Abstract (EN): The aim of this work was to study the influence of two additional elements - silver and chromium - on the structure and mechanical properties of TiAl-M (M = Ag, Cr) thin films synthesised by sputtering. The films were studied in the as-deposited condition (metastable state) and after successive annealings performed in order to obtain the stable (gamma-TiAl)-based intermetallic phase. The experimental techniques used in this work for chemical and structural characterisation were electron probe microanalysis, transmission electron microscopy/electron diffraction, X-ray diffraction and differential scanning calorimetry. The mechanical analysis consisted of the determination of hardness and ductility. To do this, a new tensile test procedure able to evaluate the ductility of thin films was developed. The results showed that, contrary to the as-deposited state, the addition of silver or chromium does not lead to a significant improvement in the mechanical properties, hardness and ductility of the heat-treated films (gamma-TiAl structure). However, they did contribute to a better understanding of the role of silver and chromium on the structure of these titanium aluminides.

Language: English

Type (Professor's evaluation): Scientific

No. of pages: 6