Influence of nitrogen impurities on the formation of active species in Ar-O-2 plasmas

• Tipo: Artigo em Revista Científica Internacional
• Data: 2011

Autores

Guerra, V (Autor) Outra; Kutasi, K (Autor) Outra; P. A . Sá (Autor) FEUP; Lino da Silva, ML (Autor) Outra

Revista

Título: EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS

Vol. 56

Página Final: 24004

ISSN: 1286-0042

Editora: Palgrave Macmillan

Indexação

ISI Web of Knowledge - 5 Citações

ISI Web of Science

Scopus - 6 Citações

Classificação Científica

FOS: Ciências exactas e naturais

Outras Informações

ID Authenticus: P-002-K38

DOI: 10.1051/epjap/2011110194

Abstract (EN): A self-consistent kinetic model was developed in order to study the production of active species in Ar-O-2 surface-wave microwave plasmas with a relatively small N-2 addition. It is shown that the Ar-O-2-N-2 mixture produces efficiently the same active species as an Ar-O-2 discharge, including oxygen atoms, metastable O-2(a(1) Delta(g)) molecules and the VUV emitting Ar(4s) states. Furthermore, active N-containing species are additionally produced, in particular N atoms and NO ground-state and excited molecules, which makes the ternary mixture very interesting for numerous plasma applications.

Idioma: Inglês

Tipo (Avaliação Docente): Científica

Nº de páginas: 6