MODELING AND SIMULATION OF CARBON MASK ADSORPTIVE REACTORS

• Type: Article in International Scientific Journal
• Date: 1995

Authors

SOARES, RC (Author) Other; José Miguel Loureiro (Author) FEUP; SERENO, C (Author) Other; Alírio Rodrigues (Author) FEUP

Journal

Title: Industrial & Engineering Chemistry Research

Vol. 34 No. 1

Pages: 2762-2768

ISSN: 0888-5885

Publisher: American Chemical Society

Indexing

ISI Web of Knowledge - 9 Citations

ISI Web of Science

Scopus - 8 Citations

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Other information

Authenticus ID: P-001-GJ7

DOI: 10.1021/ie00047a027

Abstract (EN): A carbon gas mask is considered in this paper for the elimination of CNCl by adsorption in the activated carbon support-and simultaneous second order chemical reaction with the impregnant metal. A model, taking into account nonlinear adsorption, chemical reaction, film and intraparticle mass transfer resistances, and axial dispersion is written and solved by the moving finite elements method. In the very short beds used in carbon gas masks, axial dispersion is probably important. Simulations are carried out for different values of the parameters in order to assess the influence of the intraparticle and film mass transfer resistances and of the rate of reaction on the system behavior in the presence of axial dispersion. It is shown that, although axial dispersion does not alter the general behavior of the system, its presence can reduce dramatically the usefulness of these respirators. On the other hand, two different-correlations give more than 1 order of magnitude differences in the value of axial dispersion to be expected in the bed.

Language: English

Type (Professor's evaluation): Scientific

No. of pages: 7