Annealing influence on the magnetostructural transition in Gd5Si1.3Ge2.7 thin films

• Type: Article in International Scientific Journal
• Date: 2015

Authors

Pires, AL (Author) Other; Belo, JH (Author) Other; Gomes, L (Author) Other; Hadimani, RL (Author) Other; Jiles, DC (Author) Other; Fernandes, L (Author) Other; Tavares, PB (Author) Other; araujo, j. p. (Author) FCUP; Lopes, AML (Author) Other; pereira, a. m. (Author) FCUP

Journal

Title: Materials Letters

Vol. 159

Pages: 301-304

ISSN: 0167-577X

Publisher: Elsevier

Indexing

ISI Web of Knowledge - 13 Citations

Scopus - 12 Citations

Other information

Authenticus ID: P-00G-D70

DOI: 10.1016/j.matlet.2015.05.029

Abstract (EN): Due to the emerging cooling possibilities at the micro and nanoscale, such as the fast heat exchange rate, the effort to synthesize and optimize the magnetocaloric materials at these scales is rapidly growing. Here, we report the effect of different thermal treatments on Gd5Si1.3Ge2.7 thin film in order to evaluate the correlation between the crystal structure, magnetic phase transition and magnetocaloric effect. For annealing temperatures higher than 773 K, the samples showed a typical paramagnetic behavior. On the other hand, annealing below 773 K promoted the suppression of the magnetostructural transition at 190 K, while the magnetic transition around 249 K is not affected. This magnetostructural transition extinction imparts reflected in the magnetocaloric behavior and resulted in a drastic decrease in the entropy change peak value. Nevertheless, an increase in 25% of the T-c and an increasing Delta T-FWHM from 23 to 49 K of its operation temperature interval, Delta T, upon annealing, are crucial for future application in magnetic refrigeration.

Language: English

Type (Professor's evaluation): Scientific

No. of pages: 4