Oxygen plasma surface interaction in treatments of polyolefines

• Type: Article in International Scientific Journal
• Date: 2005

Authors

Belmonte, T (Author) Other; Carlos Daniel Diogo Matias Pintassilgo (Author) FEUP; Czerwiec, T (Author) Other; Henrion, G (Author) Other; Hody, V (Author) Other; Thiebaut, JM (Author) Other; Loureiro, J (Author) Other

Journal

Title: Surface and Coatings Technology

Vol. 200

Pages: 26-30

ISSN: 0257-8972

Publisher: Elsevier

Indexing

ISI Web of Knowledge - 61 Citations

Scopus - 56 Citations

Other information

Authenticus ID: P-000-18M

DOI: 10.1016/j.surfcoat.2005.02.108

Abstract (EN): In this work, etch rates of hexatriacontane, used as a model polyolefins, as high as similar to 10 mg s(-1) m(-2) in late O-2 post-discharge are obtained at 333 K where no significant UV nor VUV irradiation occurs. Introducing N-2 in the gas mixture helps us to control the ratio of O/O-2 densities, which is shown here to play a key role in the functionalization or etching of the HTC. The oxygen atoms are required for any further modification of the HTC because they initiate the formation of the radical chains by abstraction of one hydrogen. However, O((3)p) atoms do not contribute directly to break the polymer chain close to room temperature but they can functionalize it. It is O-2 in all states that is the important reactive species for the etching because of the role played by the peroxide species on the scission of the carbonaceous chains. The etching step is related to the O/O-2 ratio.

Language: English

Type (Professor's evaluation): Scientific

No. of pages: 5