Characterization of nanostructured HfO2 films using RBS and PAC

• Type: Article in International Scientific Journal
• Date: 2012

Authors

Cavalcante, FHM (Author) Other; Gomes, MR (Author) Other; Carbonari, AW (Author) Other; Pereira, LFD (Author) Other; Rossetto, DA (Author) Other; Costa, MS (Author) Other; Alves, E (Author) Other; Barradas, NP (Author) Other; Franco, N (Author) Other; Redondo, LM (Author) Other; Lopes, AML (Author) Other; Soares, JC (Author) Other

Journal

Title: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Vol. 273

Pages: 195-198

ISSN: 0168-583X

Publisher: Elsevier

Indexing

ISI Web of Knowledge - 1 Citation

Scopus - 1 Citation

Scientific classification

FOS: Engineering and technology > Other engineering and technologies

Other information

Authenticus ID: P-002-D1H

DOI: 10.1016/j.nimb.2011.07.074

Abstract (EN): The hyperfine field at Ta-181 lattice sites in a nanostructured HfO2 thin film doped with Fe was studied using Rutherford Backscattering Spectrometry and Perturbed Angular Correlation techniques. The 409 nm Hf film was deposited by Electron Beam Evaporation on a silicon substrate. The radioactive Hf-181 ions were produced by neutron activation of the nanofilm in the Brazilian Research Reactor OPEN IEA-R1) by the reaction Hf-180(n,gamma)Hf-181. These studies provided an excellent opportunity to obtain unique information regarding local arrangement of the grains, structure, phase transformations of nanoparticles and interfaces of nanostructured materials and the thin film.

Language: English

Type (Professor's evaluation): Scientific

No. of pages: 4