Influence of composition, bonding characteristics and microstructure on the electrochemical and optical stability of AlOxNy thin films

• Tipo: Artigo em Revista Científica Internacional
• Data: 2013

Autores

J. Borges (Autor) Outra; C. Fonseca (Autor) FEUP; N.P. Barradas (Autor) Outra; E. Alves (Autor) Outra; T. Girardeau (Autor) Outra; F. Paumier (Autor) Outra; F. Vaz (Autor) Outra; L. Marques (Autor) Outra

Revista

Título: Electrochimica Acta

Vol. 106

Páginas: 23-34

ISSN: 0013-4686

Editora: Elsevier

Indexação

ISI Web of Knowledge - 12 Citações

ISI Web of Science

Scopus - 13 Citações

Classificação Científica

FOS: Ciências da engenharia e tecnologias > Engenharia dos materiais

CORDIS: Ciências Tecnológicas > Engenharia > Engenharia de materiais

Outras Informações

ID Authenticus: P-006-7VJ

DOI: 10.1016/j.electacta.2013.05.020

Abstract (EN): Thin films of AlOxNy were deposited by magnetron sputtering in a wide composition range. Different structures and morphologies were observed, depending on the composition and bonding states, which opened the possibility to tailor the properties of this oxynitride system between those of pure Al and those of nitride and oxide films. In a wide range of stoichiometries, one can report the formation of nanocomposite porous films, where Al nanoparticles are dispersed in an amorphous matrix of AlOxNy. The electrochemical behaviour of the films was studied in isotonic NaCl solution. It was observed that the pitting potential characteristic of aluminium disappears with the incorporation of oxygen and nitrogen in the films, being replaced by a smooth current increase. Electrochemical impedance spectroscopy performed during 35 days showed that the corrosion resistance of the films steadily increases. The unusual optical reflectance profile of some films is maintained after immersion for several months.

Idioma: Inglês

Tipo (Avaliação Docente): Científica

Nº de páginas: 12