Experimental design to optimize degradation of organic compounds in wastewater from semiconductor industry using fenton reagent

• Tipo: Artigo em Livro de Atas de Conferência Internacional
• Data: 2008

Autores

Carmen Rodrigues (Autor) FEUP; Nídia Caetano (Autor) FEUP; Hélder Durão (Autor) Outra

Ata de Conferência Internacional

Título: IWA World Water Congress 2008

Viena, Austria, 7 a 12 de Setembro de 2008

Classificação Científica

FOS: Ciências da engenharia e tecnologias > Engenharia química

CORDIS: Ciências Tecnológicas > Engenharia > Engenharia química

Outras Informações

Abstract (EN): The aim of this work was to study the possibility of treating an industrial semiconductor wastewater by combining physical and chemical methods. The combined treatment consisted of pH adjustment to 2 followed by filtration and then chemical oxidation with Fenton reagent over the resulting filtered wastewater. In chemical oxidation treatment, the isolated effect of the variables on the degradation of the organic compounds - measured by chemical oxygen demand (COD) removal - was first studied: pH (3 to 5), reaction time (0.25 to 5 hours), hydrogen peroxide concentration (2.1 to 5.9 M) and FeSO4: H2O2 mass ratio (1:5 to 3:2). Higher COD removal (75%) was obtained when a pH value of 3, reaction time of 4 hours, hydrogen peroxide concentration of 4.2 M and FeSO4: H2O2 mass ratio of 1:5 were used. The global efficiency of COD removal by combination of the two treatments was 80%. The influence of three variables and their interactions was evaluated, using an experimental design of the type 23. The design also allowed the conclusion that reaction time has a statistical meaning.

Idioma: Inglês

Tipo (Avaliação Docente): Científica

Nº de páginas: 8