Structural and mechanical properties of Ti-Si-C-ON for biomedical applications

• Type: Article in International Scientific Journal
• Date: 2008

Authors

Guimaraes, F (Author) Other; Oliveira, C (Author) Other; E. W. Sequeiros (Author) FEUP; Torres, M (Author) Other; Susano, M (Author) Other; Henriques, M (Author) Other; Oliveira, R (Author) Other; Galindo, RE (Author) Other; Carvalho, S (Author) Other; Parreira, NMG (Author) Other; Vaz, F (Author) Other; Cavaleiro, A (Author) Other

Journal

Title: Surface and Coatings Technology

Vol. 202

Pages: 2403-2407

ISSN: 0257-8972

Publisher: Elsevier

Indexing

ISI Web of Knowledge - 10 Citations

Scopus - 12 Citations

Other information

Authenticus ID: P-004-1FA

DOI: 10.1016/j.surfcoat.2007.08.056

Abstract (EN): Ti-Si-C-ON films were deposited by DC reactive magnetron sputtering using different partial pressure of oxygen (P-O2) and nitrogen (p(N2)) ratio. Compositional analysis revealed the existence of two different growth zones for the films; one zone deposited under low P-O2/P-N2 and another zone deposited under high P-O2/P-N2. The films produced under low P-O2/P-N2 were deposited at a lower rate and presented a fcc structure, as well as, dense and featureless morphologies. The films deposited with high P-O2/P-N2, consequently higher oxygen content, were deposited at a higher rate and developed an amorphous structure. The structural changes are consistent with the hardness and Young's modulus evolution, as seen by the significant reduction of the hardness and influence on the Young's modulus by increasing P-O2/P-N2.

Language: English

Type (Professor's evaluation): Scientific

No. of pages: 5