Go to:
Logótipo
Comuta visibilidade da coluna esquerda
Você está em: Start > Publications > View > In situ infrared characterisation of the interfacial oxide during the anodic dissolution of a silicon electrode in fluoride electrolytes
Publication

Publications

In situ infrared characterisation of the interfacial oxide during the anodic dissolution of a silicon electrode in fluoride electrolytes

Title
In situ infrared characterisation of the interfacial oxide during the anodic dissolution of a silicon electrode in fluoride electrolytes
Type
Article in International Scientific Journal
Year
1996
Authors
C. Fonseca
(Author)
FEUP
View Personal Page You do not have permissions to view the institutional email. Search for Participant Publications View Authenticus page View ORCID page
F.Ozanam
(Author)
Other
The person does not belong to the institution. The person does not belong to the institution. The person does not belong to the institution. Without AUTHENTICUS Without ORCID
J.N. Chazalviel
(Author)
Other
The person does not belong to the institution. The person does not belong to the institution. The person does not belong to the institution. Without AUTHENTICUS Without ORCID
Journal
Title: Surface ScienceImported from Authenticus Search for Journal Publications
Vol. 365
Pages: 1-14
ISSN: 0039-6028
Publisher: Elsevier
Indexing
Publicação em ISI Web of Science ISI Web of Science
Scientific classification
FOS: Engineering and technology > Other engineering and technologies
Other information
Authenticus ID: P-00P-WGV
Abstract (EN): The interfacial oxides formed under steady-state anodic polarisation of p-silicon in fluoride electrolytes have been studied using in situ infrared spectroscopy in the difference mode. The oxide is characterized in the 900 to 1250 cm-1 range by the vSiO TO and LO bands, and by other absorption bands related to oxide defects such as non-bridging oxygens. The shape and magnitude of all these bands strongly depend on formation potential as well as on electrolyte composition. Oxide thickness can be estimated from the intensity of the TO absorption band. It is shown to increase with potential and to be little dependent on electrolyte composition. On the other hand, obtaining reliable structural information requires to quantitatively account for both LO and TO bands. Specifically, the frequency splitting between LO and TO modes as well as a properly defined average frequency appear as the relevant parameters. In the present case, the oxides grown at low current (i.e., for low fluoride concentration and at potentials corresponding to the second electropolishing plateau) are those exhibiting a high SiO vibrator density and a low defect concentration.
Language: English
Type (Professor's evaluation): Scientific
Documents
We could not find any documents associated to the publication.
Related Publications

Of the same journal

Selective oxidation of ammonia over Ru(0 0 0 1) (2004)
Article in International Scientific Journal
Sónia Carabineiro; Matveev, AV; Gorodetskii, VV; Nieuwenhuys, BE
Selective oxidation of ammonia over Ir(1 1 0) (2002)
Article in International Scientific Journal
Sónia Carabineiro; Nieuwenhuys, BE
Reduction of N2O by H2 on the Ir(1 1 0) surface: Oscillations in rate (2001)
Article in International Scientific Journal
Sónia Carabineiro; Nieuwenhuys, BE
New developments on size-dependent growth applied to the crystallization of sucrose (2007)
Article in International Scientific Journal
Martins, PM; Rocha, F
Kinetics and thermodynamics of sucrose crystallization from pure solution at different initial supersaturations (2010)
Article in International Scientific Journal
Issam A Khaddour; Luis S M Bento; Antonio M A Ferreira; Fernando A N Rocha

See all (14)

Recommend this page Top
Copyright 1996-2025 © Faculdade de Direito da Universidade do Porto  I Terms and Conditions  I Acessibility  I Index A-Z
Page created on: 2025-08-06 at 11:02:40 | Privacy Policy | Personal Data Protection Policy | Whistleblowing