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In situ characterization of the p-Si/NH4F interface during dissolution in the current oscillation regime
Title
In situ characterization of the p-Si/NH4F interface during dissolution in the current oscillation regime
Type
Article in International Scientific Journal
Year
1998
Authors
S.Cattarin
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J.N.Chazalviel
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Carlos Fonseca
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F.Ozanam
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L.M.Peter
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G. Schlichthorl
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J.Stumper
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FOS:
Engineering and technology > Other engineering and technologies
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Language:
Portuguese
Type (Professor's evaluation):
Scientific
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