Influence of nitrogen impurities on the formation of active species in Ar-O-2 plasmas

• Type: Article in International Scientific Journal
• Date: 2011

Authors

Guerra, V (Author) Other; Kutasi, K (Author) Other; P. A . Sá (Author) FEUP; Lino da Silva, ML (Author) Other

Journal

Title: EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS

Vol. 56

Final page: 24004

ISSN: 1286-0042

Publisher: Palgrave Macmillan

Indexing

ISI Web of Knowledge - 5 Citations

ISI Web of Science

Scopus - 6 Citations

Scientific classification

FOS: Natural sciences

Other information

Authenticus ID: P-002-K38

DOI: 10.1051/epjap/2011110194

Abstract (EN): A self-consistent kinetic model was developed in order to study the production of active species in Ar-O-2 surface-wave microwave plasmas with a relatively small N-2 addition. It is shown that the Ar-O-2-N-2 mixture produces efficiently the same active species as an Ar-O-2 discharge, including oxygen atoms, metastable O-2(a(1) Delta(g)) molecules and the VUV emitting Ar(4s) states. Furthermore, active N-containing species are additionally produced, in particular N atoms and NO ground-state and excited molecules, which makes the ternary mixture very interesting for numerous plasma applications.

Language: English

Type (Professor's evaluation): Scientific

No. of pages: 6