Effect of rapid thermal annealing on texture and properties of pulsed laser deposited zinc oxide thin films

• Type: Article in International Scientific Journal
• Date: 2013

Authors

Sekhar, KC (Author) Other; Levichev, S (Author) Other; Kamakshi, K (Author) Other; Doyle, S (Author) Other; Chahboun, A (Author) Other; Gomes, MJM (Author) Other

Journal

Title: Materials Letters

Vol. 98

Pages: 149-152

ISSN: 0167-577X

Publisher: Elsevier

Indexing

ISI Web of Knowledge - 13 Citations

Scopus - 14 Citations

Other information

Authenticus ID: P-005-0WG

DOI: 10.1016/j.matlet.2013.02.032

Abstract (EN): A comparative study on the properties of pulsed laser deposited ZnO thin films as a function of rapid thermal annealing temperature (T-a) is presented. Grazing incidence x-ray diffraction pattern reveals that preferred orientation of the films changes from (002) to (103) as T-a varies from 500 to 800 degrees C. A clear correlation between grain morphology and texture formation is noticed. Photoluminescence spectra of all films show a strong near-band-edge ultraviolet (UV) emission and the UV emission intensity increases with T-a. Simultaneously, a weak and broad green emission centered at 505 nm corresponds to oxygen vacancies also emerged in the films annealed at T-a >= 600 degrees C. A significant hysteresis behavior is observed in current-voltage characteristics and attributed to trapping/de-trapping driven effect. It is shown that high resistance state is dominated by space charge limited currents and low resistance state is governed by both Pool-Frenkel (2-5 V) and Schottky emission (0-2 V).

Language: English

Type (Professor's evaluation): Scientific

No. of pages: 4