Magnetic properties of amorphous Co0.74Si0.26/Si multilayers with different numbers of periods

• Type: Article in International Scientific Journal
• Date: 2010

Authors

G.N. Kakazei (Author) FCUP; N.M. Santos (Author) Other; C. Quiros (Author) Other; M. Velez (Author) FCUP; J.I. Martin (Author) Other; J.M. Alameda (Author) FCUP; V.O. Golub (Author) Other; O.Y. Saliuk (Author) Other; Y.G. Pogorelov (Author) FCUP; J.B. Sousa (Author) FCUP; M.C. Carmo (Author) Other; N.A. Sobolev (Author) Other

Journal

Title: Journal of Nanoscience and Nanotechnology

Vol. 36 No. 8-9

Pages: 821-825

ISSN: 1533-4880

Publisher: American Scientific Publishers

Indexing

ISI Web of Science

Scientific classification

FOS: Natural sciences > Physical sciences

Other information

Abstract (EN): Two sets of [Co0.74Si0.26(5nm)/Si(s)](n) amorphous films were prepared by magnetron sputtering: one in the form of multilayers with the Si spacer thickness s fixed at 3 nm, and the number n of periods varying from 1 to 10 and the other with only two periods and s varying from 3 to 24 nm (trilayers). In both sets, the Co0.74Si0.26 layer thickness t was fixed at 5 nm. All the samples except the one with s=24 nm manifest antiferromagnetic coupling. Their magnetic properties at room temperature were probed using the magnetooptical transverse Kerr effect (MOTKE) and ferromagnetic resonance (FMR). The relative increase in the saturation magnetization M-s (for trilayers, relative to a structure with s=24 nm; for multilayers, relative to the single-layer structure) determined from the FMR measurements was compared with the exchange coupling strength H-J(AF) obtained from the MOTKE studies. The dependences of H-J(AF) and M-s on n and s were found to be very similar to each other. Possible mechanisms of this similarity are discussed. (C) 2010 American Institute of Physics.

Language: English

Type (Professor's evaluation): Scientific