Abstract (EN):
It is well established that electrical methods, such as the application of a high-density (10(10)-10(11) A m(-2)) current, can be employed for the switching of magnetization in thin ferromagnetic films and hetero-structures after their patterning at the nanoscale. We find that magnetization is robustly switchable, i.e., at macroscopic scales (up to a few millimeters in lateral directions), in a single similar to 30 nm-thick layer of alpha-Fe upon discharging a capacitor through the sample. Interestingly, samples sputtered at enhanced base pressures (similar to 10(-6) mbar) exhibited much lower switching thresholds with no bias field, while their electrical conductivity is anomalously high ( higher than that in bulk of alpha-Fe). We argue that the observed enhancement of conduction relates to the mixed oxide/oxyhydroxide (FeO/FeOOH) layer formed naturally on the top of our alpha-Fe films. This provides an explanation for the magnetization switching upon discharging a capacitor in terms of the Oersted field generated by the discharge current. We analyze the ratio needed between the conductions of the FeO/FeOOH layer and the underlying alpha-Fe for the effective action of the Oersted field.
Language:
English
Type (Professor's evaluation):
Scientific
No. of pages:
5