Modelling the Low-Pressure N(2)-O(2) Plasma Afterglow to Determine the Kinetic Mechanisms Controlling the UV Emission Intensity and Its Spatial Distribution for Achieving an Efficient Sterilization Process

• Type: Article in International Scientific Journal
• Date: 2008

Authors

Kutasi, K (Author) Other; Saoudi, B (Author) Other; Carlos Daniel Diogo Matias Pintassilgo (Author) FEUP; Loureiro, J (Author) Other; Moisan, M (Author) Other

Journal

Title: Plasma Processes and Polymers

Vol. 5

Pages: 840-852

ISSN: 1612-8850

Publisher: Wiley-Blackwell

Indexing

ISI Web of Knowledge - 27 Citations

Scopus - 24 Citations

Other information

Authenticus ID: P-003-TXD

DOI: 10.1002/ppap.200800085

Abstract (EN): The flowing afterglow of a N(2)-O(2) microwave discharge intended to provide intense and spatially uniform UV emission for an efficient inactivation of bacterial spores is modelled with a 3-D hydrodynamic model leading to the spatial density distribution of the species in the reactor. The agreement of the calculated densities of the NO(A) and NO(B) UV emitting species with the corresponding measured emission intensities strongly supports the choice of the kinetic reactions retained in the model. In that respect, the specific contribution of N and O atoms to the spatial distribution of the NO(A) density (generating the NO(gamma) system) in the late afterglow is, for the first time, brought into relief.

Language: English

Type (Professor's evaluation): Scientific

No. of pages: 13